(TSS#6237) This 2015 Helios NanoLab 400 DualBeam is used for TEM lamella prep, circuit edit front and back, defect/failure analysis, nanofabrication and  nanoprototyping.

• Elstar FEG Electron column, 350v–30kV
• In-lens SE and BSE detector and STEM
• Elstar Electron column is capable of sub-nanometer STEM images
• Sidewinder Ion column: 30kV
• Milling Power: 21nA beam current
• CDEM with 5nm image resolution
• Windows OS and FEI UI; TSS networking computer to make IT happy
• Five-axis motorized compucentric stage with load lock
• Specimen Coverage: 100mm diameter
• Load Lock
• Chamber scope for real time observation
• Gas Injection System (GIS): Max 4 injectors 2 included, chemistry of choice
• Vacuum System, oil free consisting IGP x 3, air cooled Turbo and dry PVP
• Includes installation, basic operational training, with 90-day warranty

Available Options Include:
• GIS chemistries
• STEM with Flip Stage
• Omniprobe extraction
• I-Beam upgrade: 65nA
• Infrared for backside editing
• EDX
• Plasma Cleaner