The FIB 800-M uses Magnum ion column. This FIB is used for circuit edit (front and back side), defect and failure analysis, TEM lamella prep, nanofabrication, nanoprototyping and MEMS. Includes installation, operational training and 90day warranty.

This FEI FIB 800-M includes:
• Magnum ion column, 5–30kV
• Milling Power: 22nA beam current and 100 A/cm² current density
• CDEM for ions and electron images with 7nm image resolution
• Windows OS and FEI UI; TSS networking computer to make IT happy
• 5-axis motorized eucentric tilt stage
• Full coverage of 200mm diameter sample
• Chamber scope for real time observation
• Gas Injection System: Max 4 injectors; 2 included, chemistry of choice
• Vacuum System: column IGP, air cooled Turbo and mechanical PVP

Available Options Include:
• GIS chemistries
• Plasma Cleaner
• Infrared for backside editing
• Omniprobe for lift out
• Omniprobe for probing
• Dry pump to replace mechanical oil PVP