(TSS#6176) The FEI FIB 200-S uses the Sidewinder ion column. This FIB is used for circuit edit (front and back side), defect and failure analysis, TEM lamella prep, nanofabrication and nanoprototyping and MEMS. Includes installation, operational training and 90-day warranty

This FEI FIB200-S includes:
• Sidewinder column 500V – 30kV; excellent beam profile and stability
• Milling Power: 21nA beam current
• CDEM for ions and electron images with 7nm image resolution
• Windows OS and FEI UI; TSS networking computer to make IT happy
• 5-axis, comp-eucentric tilt stage
• Full coverage of 80mm diameter
• Front door load
• Chamber scope for real time observation
• Gas Injection System: Max 4 injectors; 2 included, chemistry of choice
• Vacuum System: column IGP, air cooled Turbo and mechanical PVP

Available Options Include:
• GIS chemistries
• Plasma Cleaner
• Upgrade to 65nA beam current
• Infrared camera for backside editing
• Omniprobe for lift out
• Omniprobe for probing
• Dry pump to replace mechanical oil PVP