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(TSS#4478) This 2000 Altura 830 DualBeam is used for TEM lamella prep, circuit edit front & back, defect/failure analysis, nanofabrication, nanoprototyping and MEMS.
• Electron column with Schottky FEG, 350v–30kV
• In lens SE and BSE detector
• Magnum Ion column with Ga 69/71 LMIS, 5–30kV
• Milling Power: 21nA beam current and 100 A/cm2
• Windows OS and FEI UI; TSS networking computer to make IT happy
• Five-axis motorized comp-eucentric stage with 200mm wafer load lock
• XYZ: 205 x 205 x 10 mm
• Tilt: – 10° to + 60°, Rotation: n x 360°
• Chamber scope for real time observation
• Gas Injection System (GIS): Max 4 injectors 2 included, chemistry of choice
• Vacuum System, oil free consisting of Column IGP x 3, air cooled Turbo and dry PVP
• Includes installation & operational training (North America)*
* Installation outside of North America will be quoted.
• 90 day warranty
Additional Options Include:
• GIS chemistries
• Infrared camera for backside editing
• Plasma Cleaner