FEI Altura 830


FEI Altura 830


(TSS#4478) This 2000 Altura 830 DualBeam is used for TEM lamella prep, circuit edit front & back, defect/failure analysis, nanofabrication, nanoprototyping and MEMS.

• Electron column with Schottky FEG, 350v–30kV
• In lens SE and BSE detector
• Magnum Ion column with Ga 69/71 LMIS, 5–30kV
• Milling Power: 21nA beam current and 100 A/cm2
• Windows OS and FEI UI; TSS networking computer to make IT happy
• Five-axis motorized comp-eucentric stage with 200mm wafer load lock
• XYZ: 205 x 205 x 10 mm
• Tilt: – 10° to + 60°,  Rotation: n x 360°
• Chamber scope for real time observation
• Gas Injection System (GIS): Max 4 injectors 2 included, chemistry of choice
• Vacuum System, oil free consisting of Column IGP x 3, air cooled Turbo and dry PVP

• Includes installation & operational training (North America)*
* Installation outside of North America will be quoted.
• 90 day warranty

Additional Options Include:
• GIS chemistries
• Infrared camera for backside editing
• Plasma Cleaner

Included With Instrument

90 Day Warranty 90 Day Warranty Training Basic Operational Training

Optional Upgrades and Services

Annual Service Contracts Available Annual Service Contracts Preventive Maintenance Visits Preventive Maintenance On Demand Service Contacts On Demand Service

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